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Monolayer Graphene on 300 nm SiO₂/Si Choose Your Size:10 mm x 10 mm - Pack 4 unitsMonolayer Graphene on 300 nm SiO Si Fully Covered Processed in ISO 7 Cleanroom Our monolayer graphene on SiO Si (fully covered) is a bidimensional material produced by CVD and transferred to a circular substrate of SiO Si (300nm) by a semi dry transfer process. We consider it to be a benchmark product in the graphene market not only for its excellent quality, but also for its shape, size and number of applications. Graphene Film Growth method: CVD
It can be done chemically
biosensors
Low permeability materials
If your application requires more specific quality control (AFM
Our graphene oxide is noted for its mechanical and thermal properties
mGFETs can be tuned to be sensitive only to the stimulus of interest and have shown breakthrough performance in areas such as graphene device research
· Optical Microscopy inspection of each individual sample to ensure good transfer quality and purity
Biosensors
“Water Desalination across Nanoporous Graphene”
The metal pads are passivated to avoid degradation and reduce leakage currents
· AFM Thickness (air @RT): <1nm
· Grain size: Up to 20 μm
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